摘要
The microstructure characteristic and formation mechanism of the crackfree and ablation-resistant TaC coating deposited on the C/C composite by Chemical Vapour Deposition（CVD） were investigated, using the reaction system of TaCl5-C3H6-H2-Ar. The results show that the nanosized pore structure formed in the TaC coating interior during CVD process is the main factor to reduce the hardness, elastic modulus, linear expansibility and inner thermal stress. Then crackfree coatings can be prepared and their thermal shock resistance can be enhanced. To obtain the dense and homogeneous matrix surface is necessary for the crackfree and low stress coating. The TaC coating structure that distributes from the dense matrix towards loose coating surface will result in the thick crackfree coating with good thermal shock resistance.
The microstructure characteristic and formation mechanism of the crackfree and ablation-resistant TaC coating deposited on the C/C composite by Chemical Vapour Deposition（CVD） were investigated, using the reaction system of TaCl5-C3 H6-H2-Ar. The results show that the nanosized pore structure formed in the TaC coating interior during CVD process is the main factor to reduce the hardness, elastic modulus, linear expansibility and inner thermal stress. Then crackfree coatings can be prepared and their thermal shock resistance can be enhanced. To obtain the dense and homogeneous matrix surface is necessary for the crackfree and low stress coating. The TaC coating structure that distributes from the dense matrix towards loose coating surface will result in the thick crackfree coating with good thermal shock resistance.
出处
《中国有色金属学会会刊：英文版》
EI
CSCD
2005年第6期1206-1213,共8页
Transactions of Nonferrous Metals Society of China
基金
Project(2002AA305207)supportedbytheNationalHigh-TechResearchandDevelopmentProgramofChina
Project(03JJY3073)supportedbytheNaturalScienceFoundationofHunanProvince
Project(D200525004)supportedbytheEducationFounda-tionofHubeiProvince
