摘要
以SnCl_4-H_2O-N_2作为实验体系,采用流态化CVD技术制备了超细Al_2O_3-SnO_2复合粒子.利用透射电子显微镜(TEM)、X荧光光谱仪(XRF)、高分辨电子显微镜(HREM)等现代测试手段考察了SnO_2在Al_2O_3表面的分散形态及操作参数对SnO_2成膜与成核的影响.讨论了化学气相包覆过程机理.
Ultrafine Al2O3- SnO2 composite particles were prepared by fluidization chemical vapor deposition technology with SnCl4-H2O-N2 systems. By the methods of TEM, XRF, HREM ,the distribution of SnO2 over Al2O3 particle surface and the effect of operating parameters on forming films and producing particles were studied. The mechanism of chemical vapor coating was expounded
出处
《化工学报》
EI
CAS
CSCD
北大核心
1994年第6期723-728,共6页
CIESC Journal
基金
国家自然科学基金资助项目
