摘要
探讨了溅射用铁电陶瓷靶（ＰＺＴ，ＰＬＺＴ）的烧结工艺，并对其显微结构进行了分析。结果表明，采用新的烧结工艺（含保护措施），可以有效地抑制ＰｂＯ的挥发，制备出组织结构及成分均匀、ＰｂＯ含量正常、致密度较高、不变形的符合磁控溅射要求的铁电陶瓷烧结靶。
The sintering technology of ferroelectric ceramic target(PZT,PLZT) for sputtering isdiscussed and the microstructure analyzed.The results show that the new sintering technolo-gy(including the protecting methods)is satisfactory and the target prepared meets the re-quirements of magnetically-controlled sputtering as the volatilization of PBO can be con-trolled at a normal content. The microstructure and the distribution of chemical compositionare uniform and the density is high.
出处
《华中理工大学学报》
CSCD
北大核心
1994年第3期91-94,共4页
Journal of Huazhong University of Science and Technology
基金
863高科技基金
关键词
铁电陶瓷靶
液相烧结
显微结构
erroelectric ceramic target
liquid phase sintering
microstructure
