A novel method was developed to deposit a large crystal diamond with good facets up to 1000 μm on a tungsten substrate using a microwave plasma enhanced chemical vapor deposition （MPCVD）. This method consists of tw...A novel method was developed to deposit a large crystal diamond with good facets up to 1000 μm on a tungsten substrate using a microwave plasma enhanced chemical vapor deposition （MPCVD）. This method consists of two steps, namely single-crystal nucleation and growth. Prior to the fabrication of the well-faceted, large crystal diamond, an investigation was made into the nucleation and growth of the diamond which were affected by the O2 concentration and substrate temperature. Deposited diamond crystals were characterized by scanning electron microscopy and micro-Raman spectroscopy. The results showed that the conditions of single-crystal nucleation were appropriate when the ratio of H2/CH4/O2 was about 200/7.0/2.0, while the sub- strate temperature Ts of 1000℃ to 1050℃ was the appropriate range for single-crystal diamond growth. Under the optimum parameters, a well-faeeted large crystal diamond was obtained.展开更多
The emission spectra of microwave plasma was in line measured in visible light wave band using a self made optical fiber spectrometer, the change rule of the atomic hydrogen ( H ) and double carbon radical( C 2) was g...The emission spectra of microwave plasma was in line measured in visible light wave band using a self made optical fiber spectrometer, the change rule of the atomic hydrogen ( H ) and double carbon radical( C 2) was given under different CH 4/H 2 ratios of volume flow. The effect of atomic hydrogen ( H ) on CVD diamond, deposited high quality and transparent diamond film by microwave plasma CVD (MPCVD) was analyzed according to the measured results by scanning electron microscopy(SEM), laser Raman spectrometry(Raman), and Fourier transform infrared spectrometry(FTIR). The results showed that the diamond film consisted of (220) orientation and it was homogeneous, compact, low defective, high quality film, its infrared transmissibility was about 70%, approached theoretical transmissibility of diamond. It was key conditions that a large number of atomic hydrogen ( H γ ) and double carbon radical( C 2) exist in the course of high quality diamond film growth. The research provided a rapid method for technology exploration of microwawe plasma CVD, and a reliable basis for research on growth mechanism of diamond film.展开更多
为了实现高速率、高品质多晶金刚石厚膜的生长,通过自研微波等离子体化学气相沉积(Microwave Plasma Chemical Vapor Deposition,MPCVD)设备,调节生长温度和甲烷流量,优化了多晶金刚石厚膜的生长工艺,制备出膜层平整度和质量较好、杂质...为了实现高速率、高品质多晶金刚石厚膜的生长,通过自研微波等离子体化学气相沉积(Microwave Plasma Chemical Vapor Deposition,MPCVD)设备,调节生长温度和甲烷流量,优化了多晶金刚石厚膜的生长工艺,制备出膜层平整度和质量较好、杂质较少的多晶金刚石膜,并结合拉曼光谱和X射线衍射分析,探讨了生长温度和甲烷流量与金刚石膜生长品质的关系。研究结果表明,生长速率和晶粒尺寸与生长温度及甲烷流量呈正相关,但过高或过低的生长温度、甲烷流量均不适于制备高品质多晶金刚石厚膜。因此,确定了生长温度800℃,甲烷流量35 sccm是生长高品质多晶金刚石厚膜的最佳条件。展开更多
基金supported by the Natural Science Foundation of Hubei Province of China(2008CDB255)the Educational Commission of Hubei Province of China(No.Q20081505)the Key Laboratory for Green Chemical Process of the Ministry of Education of China (No.RGCT200801)
文摘A novel method was developed to deposit a large crystal diamond with good facets up to 1000 μm on a tungsten substrate using a microwave plasma enhanced chemical vapor deposition （MPCVD）. This method consists of two steps, namely single-crystal nucleation and growth. Prior to the fabrication of the well-faceted, large crystal diamond, an investigation was made into the nucleation and growth of the diamond which were affected by the O2 concentration and substrate temperature. Deposited diamond crystals were characterized by scanning electron microscopy and micro-Raman spectroscopy. The results showed that the conditions of single-crystal nucleation were appropriate when the ratio of H2/CH4/O2 was about 200/7.0/2.0, while the sub- strate temperature Ts of 1000℃ to 1050℃ was the appropriate range for single-crystal diamond growth. Under the optimum parameters, a well-faeeted large crystal diamond was obtained.
文摘The emission spectra of microwave plasma was in line measured in visible light wave band using a self made optical fiber spectrometer, the change rule of the atomic hydrogen ( H ) and double carbon radical( C 2) was given under different CH 4/H 2 ratios of volume flow. The effect of atomic hydrogen ( H ) on CVD diamond, deposited high quality and transparent diamond film by microwave plasma CVD (MPCVD) was analyzed according to the measured results by scanning electron microscopy(SEM), laser Raman spectrometry(Raman), and Fourier transform infrared spectrometry(FTIR). The results showed that the diamond film consisted of (220) orientation and it was homogeneous, compact, low defective, high quality film, its infrared transmissibility was about 70%, approached theoretical transmissibility of diamond. It was key conditions that a large number of atomic hydrogen ( H γ ) and double carbon radical( C 2) exist in the course of high quality diamond film growth. The research provided a rapid method for technology exploration of microwawe plasma CVD, and a reliable basis for research on growth mechanism of diamond film.
