A new partitioning methodology is presented to accelerate 130nm and beyond large scale alternating phase shift mask(Alt PSM) design flow.This method deals with granularity self adaptively.Phas...A new partitioning methodology is presented to accelerate 130nm and beyond large scale alternating phase shift mask(Alt PSM) design flow.This method deals with granularity self adaptively.Phase conflicts resolution approaches are described and strategies guaranteeing phase compatible during layout compaction are also discussed.An efficient CAD prototype for dark field Alt PSM based on these algorithms is implemented.The experimental results on several industry layouts show that the tool can successfully cope with the rapid growth of phase conflicts with good quality and satisfy lower resource consumption with different requirements of precision and speedup.展开更多
Realizing the layouts of analog/mixed-signal(AMS)integrated circuits(ICs)is a complicated task due to the high design flexibility and sensitive circuit performance.Compared with the advancements of digital IC layout a...Realizing the layouts of analog/mixed-signal(AMS)integrated circuits(ICs)is a complicated task due to the high design flexibility and sensitive circuit performance.Compared with the advancements of digital IC layout automation,analog IC layout design is still heavily manual,which leads to a more time-consuming and error-prone process.In recent years,significant progress has been made in automated analog layout design with emerging of several open-source frameworks.This paper firstly reviews the existing state-of-the art AMS layout synthesis frameworks with focus on the different approaches and their individual challenges.We then present recent research trends and opportunities in the field.Finally,we summaries the paper with open questions and future directions for fully-automating the analog IC layout.展开更多
文摘A new partitioning methodology is presented to accelerate 130nm and beyond large scale alternating phase shift mask(Alt PSM) design flow.This method deals with granularity self adaptively.Phase conflicts resolution approaches are described and strategies guaranteeing phase compatible during layout compaction are also discussed.An efficient CAD prototype for dark field Alt PSM based on these algorithms is implemented.The experimental results on several industry layouts show that the tool can successfully cope with the rapid growth of phase conflicts with good quality and satisfy lower resource consumption with different requirements of precision and speedup.
基金supported in part by the NSF under Grant No.1704758,and the DARPA IDEA program.
文摘Realizing the layouts of analog/mixed-signal(AMS)integrated circuits(ICs)is a complicated task due to the high design flexibility and sensitive circuit performance.Compared with the advancements of digital IC layout automation,analog IC layout design is still heavily manual,which leads to a more time-consuming and error-prone process.In recent years,significant progress has been made in automated analog layout design with emerging of several open-source frameworks.This paper firstly reviews the existing state-of-the art AMS layout synthesis frameworks with focus on the different approaches and their individual challenges.We then present recent research trends and opportunities in the field.Finally,we summaries the paper with open questions and future directions for fully-automating the analog IC layout.
