摘要
以叔丁酚改性酚醛树脂与双叔丁氧碳酸酐为原料,合成了一种化学增幅感光性高分子,摸索出这类合成反应的最佳条件,进而配制出一系列化学增幅抗蚀剂组成物,并对其感光性能及光解动力学进行了研究。
A kind of chemical amplification polymer is successfully synthesized by the reaction of tert-butylphenol novolac resin with di-tert- butyl dicarbonate and the optium conditions for this reaction are investigated. On this basis a series of chemical amplification resist components are pre- pared. Furthermore, their photosensitivity and photodecompo-sition kinetics are studied.
出处
《北京师范大学学报（自然科学版）》
CAS
CSCD
1993年第1期107-112,共6页
Journal of Beijing Normal University(Natural Science)
基金
国家"八五"重点科技攻关课题
关键词
叔丁酚
酚醛树脂
化学增幅
抗蚀剂
chemical amplification resist, tert-butyl phenol novolac resin, di-tert-butyl dicarbonate, photoinduced acid precursor
