摘要
通过研究对甲苯磺酸酯空心酞菁的性质,发现该化合物在紫外光照射下可生酸,是一种光生酸剂.由于酞菁类化合物本身具有光催化氧化反应的性能,因此这类光生酸剂在光蚀刻技术中将有很好的应用潜能.
A New Phthalocyanine derivative, the p-toluenesulfonylphthalocyanine was synthesized from metal-free phthalocyanine. The photolysis properties of the compound exposed with UV light was investigated. It was found that the p-toluenesulfonylphthalocyanine can generate acid after exposure. With good photocatalysis property, this photoacid-generator is applicable to chemically amplified photoresist.
出处
《感光科学与光化学》
EI
CSCD
2007年第2期142-146,共5页
Photographic Science and Photochemistry
基金
国家自然科学基金(20333080
20572059
20502013)
国家基础研究项目(2007CB808000)
关键词
化学增幅抗蚀剂
光生酸剂
光催化
酞菁
chemical amplification
photoacid generator
photo-catalysis
phthalocyanine
