摘要
论述了多层薄膜光学常数的椭偏测量原理以及测量方法。采用导纳矩阵计算多层薄膜的椭偏参数;采用统计试验法与单纯形法相结合的数值逼近法进行反演计算。更重要的是本文首次提出迭代椭偏测量法,使测量的重复性和精确度都大大提高。所谓选代椭偏测量法是不断地优选椭偏测量入射角,从而选出对该样品来说最佳椭偏测量入射角。用这种方法精确测量了相变光盘记录介质膜晶态下的光学常数,这对于相变光盘膜系结构优化设计很重要。
This paper deals with the elliptic-polarized (EP) measuring principle and testing method of the optical parameters of multi-layered thin films. The parameters of EP are computed by means of admittance matrix. The optical parameters of Multi-layered thin films are computed inversely by the digital approximation Moute Carlo method which combines with simplex method. Above all, this paper is the first to propose the interative EP measuring method which strongly improves the measuring repeatability and precision of the results. Optimum seeking angle of incidence is the core of the method. The optical parameter of optical recording media film in the crystalline state has been measured with the method. This is very important for optical design of multi-layered thin films on phase-change optical disk.
出处
《北京航空航天大学学报》
EI
CAS
CSCD
北大核心
1993年第4期1-11,共11页
Journal of Beijing University of Aeronautics and Astronautics
关键词
光学常数
椭偏测量
多层膜
optical parameters,elliptic-polarized measurement,multi-layered thin film, thin film with optical recording media on phase-change optical disk.
