摘要
对DLKD-800到离子镀膜机进行了技术改进,在改进后的DLKD-800型离子镀膜机中,用W6Mo5Gr4V2的试片(φ15×4)进行了离子渗氮的探索试验,试验取得较理想的结果,为离子渗镀复合工艺的研究奠定了基础。
A DLKD-800 HCD apparatus is improved for study on the complex technology of ionitriding -ion plating TiN only in the HCD apparatus. With W6Mo5Cr4V2 specimens, a series of ionitriding tests are made in the improved DLKD-800. The tests yield ideal results and have laid the foundation for investigation on the complex technology.
出处
《北京工业大学学报》
CAS
CSCD
1993年第4期39-42,共4页
Journal of Beijing University of Technology
关键词
渗氮
离子镀
氮化钛
镀膜机
ionitriding, ion plating, titanium nitride
