摘要
用电子束蒸发沉积钛和40keV氮离子束轰击同时进行的动态混合方法制备了氮化钛薄膜.RBS组分分析结果表明,离子束动态混合制备的氮化钛薄膜中的氧含量比不用离子束轰击的显著减少,薄膜的组分与离子原子到达比关系不大,主要受长膜过程中吸附效应的影响.随着蒸发沉积速率的提高,膜中氮含量下降,提高样品温度可获得同样效果.采用TEM和XRD对薄膜的结构进行分析测定,发现离子束动态混合制备的氮化钛薄膜主要由面心立方结构的TiN相构成,晶体取向随离子原子到达比(N/Ti)的增加,由<111>择优取向变到无择优的随机取向,然后再转变到<200>择优取向,合成的氮化钛薄膜具有良好的抗磨损性能,划痕试验表明薄膜与基体间结合力极强,临界载荷达10-15kg.
Titanium nitride films were prepared by simultaneous vacuum deposition of titanium and nitrogen ion beam bombardment with an ion energy of 40 KeV.RBS analysis showed that nitrogen ion bombardment could clearly reduce the oxygen concentration in the film. At the same atomio arrival ratio, the component ratio (N/Ti) in the films decreased with the increase of titanium deposition rate or sample temperature. This fact was considered to have arisen from the situation that the film composition was strongly affected by the adsorption of nitrogen. The films wore mainly TiN polyorystale. The preferred crystalline orientation of the film changed from <111> to <200> with the increase of the atomic arrival ratio (N/Ti). The titanium nitride films formed by dynamic ion beam mixing exhibited good and tear resistance and strong adhesion to the substrate.
出处
《应用科学学报》
CAS
CSCD
1992年第2期95-100,共6页
Journal of Applied Sciences
