摘要
X线光刻是未来亚微米应用的重要微光刻技术、近年来,同步辐射X线光源的应用是技术上一个重要发展,本文叙述了同步辐射X线光刻在微电子技术未来发展中的作用、现状及其基本技术问题。并介绍了我国同步辐射X线光刻的发展情况。
X-ray Lithography is an important microlithographic technology for submicron application in the future. Recently the application of synchroton radiation Xray source is a great progress of X-ray Lithography This paper describes the position and importance of Synchrotron Radiation X-ray Lithography in microelectronic technology, its status and main technical problems. The development of Synchrotron Radiation X-ray Lithography in our country is also introduced.
出处
《物理学进展》
CSCD
北大核心
1992年第3期359-374,共16页
Progress In Physics
