摘要
用化学式量的烧结 YBa_2Cu_3O_(7-δ)粉末作磁控溅射的靶材,原位制备出 c 轴高度定向的超导薄膜.生长在 SrTiO_3和 ZrO_2衬底上的薄膜零电阻温度88K,77K 零场临界电流密度 J_c(?)8×10~5A/cm^2研究了沉积在10×10mm^2ZrO_2衬底上 YBCO 超导薄膜的微波表面电阻 R_(?).四轮实验样品测试结果,在94GHz 下、77K 时的 R_(?)25mΩ,为同一条件下无氧铜的三分之一.采用粉末靶而不是烧结块状靶溅射原位制备高温超导薄膜,具有制备简单、成本低廉,制膜工艺可稳定重复以及便于制作大面积高质量薄膜等优点.
We have used stoichiometric YBa_2Cu_3O_(7-δ)sintered powders as magnetron sputteringtarget to prepare highly c-axis oriented superconducting films.Films on SrTiO_3 and ZrO_2 sub-strates have zero resistance at 88K and critical current density of 8×10~5A/cm^2 (77K).Microwavesurface resistances have been measured for four films made in different runs on 10×10mm^2 ZrO_2substrate.The surface resistance at 94GHz and 77K for these samples is found to be below25mΩ.Using powder target instead of bulk target has the following advantages:simple toprepare,lower in cost,high repeatability of film qualities and easier to deposite the film overlarge areas.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
1992年第4期492-497,共6页
Journal of Inorganic Materials
关键词
粉末靶
磁控溅射
超导薄膜
Powder target
Magnetron sputtering
High-temperature superconducting thin film
Microwave surface resistance
