摘要
采用国内研制的电子回旋共振化学气相沉积(ECRCVD)设备,在单晶硅衬底上沉积了金刚石薄膜。通过扫描电子显微镜(SEM)、X射线衍射仪(XRD)和激光拉曼谱仪(RAM)的测试,证明所沉积的薄膜具有明确的金刚石特征。所采用的ECRCVD设备,具有低压沉积、大面积均匀和低温生长的优点。这种方法在合成金刚石光学膜、半导体膜以及其它薄膜方面,很有发展潜力。
Diamond thin films were successfully deposited on single - crystal Si substrate at low pressure by a homemade equipment of electron cyclotron resonance chemical vapor deposition (ECRCVD) . The diamond properties of the films were surely confirmed by the tests of Scan Electron Microscopy (SEM), X-Ray Diffraction (XRD) and Raman Spectroscopy (RAM) . The ECRCVD system has many advantages in respect of low operating pressure, low substrate temperature and large depositing area. An potential application to synthesize diamond optical film, miconductor film and other kinds of films is certainly prospectire.
出处
《微细加工技术》
1992年第2期57-61,共5页
Microfabrication Technology
关键词
金刚石
薄膜
化学气相沉积
diamond film
chemical vapor deposition (CVD)
electon cyclotron resonance (ECR)
