摘要
本文通过对一台先进电子束曝光机制作掩模过程的分析,阐明设计图经计算机辅助设计系统数字化后,生成PG格式数据,再由PG格式数据转换成电子束格式数据的处理;论述了光栅扫描的原理及特点;介绍了图形发生器的作用及电子束在控制系统作用下在基片上描绘图形的过程。
The paper analyses the process of mask fabrication by an advanced electron beam lithography system. Through the analysis it describes that the CAD system forms PG format data after digitizing the mask pattern and the PG format data are trnsformed into EB format data. The principles and features of raster scan,the function of the pattern generator and the process of the electron beam writing on the substrate under the control system are also introduced.
出处
《微细加工技术》
1992年第1期1-6,共6页
Microfabrication Technology
关键词
电子束
曝光机
掩模
CAD
CAD
Pattern generator
PG format data
EB format data
