摘要
在现有国产光刻设备的基础上,研制成功了能够复印出亚微米图形的三层胶工艺,并用于制作亚微米电路。
Triple resist technology which can pattern submicron patterns has been developed and used to fabricate submicron IC's successfully depending upon the native lithography equipment.
出处
《微细加工技术》
1992年第1期59-64,共6页
Microfabrication Technology
