摘要
在室温条件下,采用恒电流电化学沉积技术直接在钨片基体上制备了白钨矿结构的CaWO4晶态薄膜.电化学反应的工艺参数为:电流密度为1mA/cm2、电解液的pH值为13.0、电化学处理时间为1.5h.采用XRD、XPS、SEM技术分析了制备的CaWO4薄膜的晶相、化学组成和表面形貌.所制备的薄膜是表面均匀致密的四方晶系的单相薄膜.
Crystallized CaWO4 film with scheelitestructure was prepared directly on tungsten substrate by electrochemical deposition technique of constant direct current at room temperature. Parameteres of the electrochemical reaction were controlled as: current density 1 mA/cm2, pH value of the electrolyte solution 13 and the duration of electrochemical treatment 1.5 hours. The film was analyzed by XRD, SEM and XPS. The measurement results showed that CaWO4 film prepared by the method was uniform and dense, and of single tetragonal structure.
出处
《四川师范大学学报（自然科学版）》
CAS
CSCD
2003年第5期513-516,共4页
Journal of Sichuan Normal University（Natural Science）
