摘要
全息片质量是影响原子全息光刻再现图形质量的关键因素,然而其制作工艺复杂,工序繁多,质量难以控制,模拟研究有助于把握全息片制作工艺中的关键环节,提高全息片的质量。详细模拟了全息片的三个主要质量指标:刻透率、分辨力以及薄膜厚度对再现像质的影响,结果表明:刻透率控制在90%左右即可满足要求,分辨率应优于0.1μm,膜层应尽量均匀。
The quality of hologram is the key factor influencing the reconstructed pattern's quality in the atom lithography technology. But the fabricating processes of the hologram are complicated and its quality is difficultly controlled. The simulation research is helpful for managing the keys in its fabricating processes and improving its quality. The effects of the three main indexes of the quality (i.e. the hollowed out ratio, hologram resolution and film thickness on the quality of the reconstructed pattern) are simulated. The results show that the hollowed out ratio of about 90% is required,the resolution should be betler than 0.1μm and the film thickness is as uniform as possible.
出处
《微细加工技术》
2003年第3期26-30,共5页
Microfabrication Technology
基金
中国科学院创新基金资助项目(A2K0009)
