摘要
本文利用离子束在玻璃上刻蚀出双频光栅,研究了光栅掩模制作中曝光量和显影条件,离子束刻蚀工艺等因素对光栅衍射效率的影响,并给出一些实验结果。
In this paper the double frequency grating is fabricated on the glass by ionbeam etching technique. The exposure and development conditions for making gra-ting mask are researched. The influence of ion beam etching process on diffra-ction efficiency of grating is discussed and the experimental results are alsogiven.
出处
《量子电子学》
CSCD
1992年第2期186-190,共5页
关键词
离子束
刻蚀
全息术
双频光栅
ion beam etching
holography
double frequency grating
