摘要
用离子束溅射工艺在石英、LY12和卫星蒙皮材料上制备了不同厚度和发射率的SiO2薄膜,研究了厚度对薄膜光学、热学性能的影响规律。用直流磁控溅射工艺制备了氧化铟锡(ITO)薄膜,研究了厚度对薄膜光学、电学性能的影响规律。利用前两部分研究成果在LY12和卫星蒙皮材料上制备成功了发射率可达0.45、光谱反射率大于0.7、同时电性能满足空间抗静电要求的复合热控薄膜。
The different thickness and thermal emissivity SiO2 films and ITO(Indium Tin Oxide) films were prepared respectively by ion beam sputtering process and DC magnetron sputtering process on quartz glass LY12 and surface material of satellite. The effect of film thickness on optical,thermal performance of film were studied. The compound films whose hot emissivity is 0.45 and solar reflectance is larger than 0.7 were prepared in surface material of satellite.
出处
《真空与低温》
2003年第2期93-97,101,共6页
Vacuum and Cryogenics
