期刊文献+

减少阴极弧金属等离子体源液滴的技术措施 被引量:3

Technical Measures of Reducing Macropaticles in the Cathodic Arc Metal Plasma Source
在线阅读 下载PDF
导出
摘要 液滴的存在并伴随着金属等离子体输运是阴极弧金属等离子体源的主要特性之一,液滴问题的严重性常常影响着阴极弧金属等离子体源广泛应用的可能性。文中针对如何减少液滴,提出了在阴极弧金属等离子体源物理和结构设计上采取的适当技术措施;然后在金属等离子体输运过程中,用正偏压的45°弯管(短磁导管)进行电磁过渡,使液滴减少到最少,使离子得到高效传输,最大限度地减少了液滴对被沉积薄膜性能的影响。 One main feature of the cathodic are metal plasma source is existing macroparticles which are transported with metal plasma,and the widely application possibility of the cathodic arc metal plasma source is often affected by the serious macroparticles problem.In this paper,in order to reduce macroparticles substantially,put for-ward a series of technical measures of improving physical and structural designs of the cathodic are metal plasma source;then use a45°curved tube(short magnetic filter)with positive bias voltage in the metal plas-ma transportation process to carry on electric,and magnetic filter further to reduce macroparticles,raise ion transportation efficiency,and decrease the effect of macroparticles on properties of deposited thin films as much as possible.
出处 《机械工程师》 2003年第6期39-41,共3页 Mechanical Engineer
关键词 阴极弧金属等离子体源 液滴(宏观粒子) 电磁过滤 cathodic are metal plasma source macroparticles electric and magnetic filter
  • 相关文献

参考文献7

二级参考文献3

共引文献41

同被引文献50

  • 1蔡志海,张平,底月兰,杜军.Ti含量对(Cr,Ti)N复合涂层组织结构与性能的影响[J].装甲兵工程学院学报,2010,24(3):72-76. 被引量:3
  • 2王福贞,唐希源,周友苏,赵双华,魏雪英,朱永林.用多弧离子镀膜机镀氮化钛[J].金属热处理,1994,19(5):17-21. 被引量:5
  • 3杨今漫,徐灿,谢二庆,陈光华.不同衬底上TiN薄膜的制备及性能研究[J].功能材料,1996,27(1):95-96. 被引量:6
  • 4Arnell R D,Colligon J S,Minnebaev F. The effect of nitrogen content on the structure and mechanical properties of TiN films produced by magnetron sputtering[J].Vacuum,1996,(05):425-431.
  • 5Tatsuya N,Takao H,Yasukazu I. The structure of TiN films deposited by arc ion plating[J].Vacuum,2002,(66):435-439.
  • 6Logothetidis S,Alexandrou I,Kokkou S. Optimization of TiN thin film growth with in-situ monitoring:the effect of bias voltage and nitrogen flow rate[J].Surface and Coatings Technology,1996,(80):66-71.
  • 7Vaz F,Machado P,Rebouta L. Mechanical characterization of reactively magnetron-sputtered TiN films[J].S Surf Coat Technol,2003,(174-175):375-382.
  • 8Pec B,Frangis N,Logothetidis S. Electron microscopy characterization of TiN films on Si,grown by D.C reactive magnetron sputtering[J].Thin Solid Films,1995.57-63.
  • 9Kuzel R,Cerny R. Complex XRD microstructural studies of hard coatings applied to PVD-deposition TiN films part Ⅱ Transition from porous to compact films and microstructural inhomogeneity of the layers[J].Thin Solid Films,1995.72-82.
  • 10Arnell R D,Colligon F S. The effect of nitrogen content on the structure and mechanical properties of TiN films produced by magnetron sputtering[J].Vacuum,1996,(05):425-431.

引证文献3

二级引证文献8

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部