摘要
在14—500K的温度范围内对插层化合物2H-Fe_(0.5)TaSe_2进行了Mossbauer谱研究。用电化学方法将Fe插入层状化合物TaSe_2,首次得到高插入量的化合物2H-Fe_(0.5)TaSe_2(Fe_x中的x可达最大值2)。Mossbauer谱的结果表明,插入的Fe处在Fe^(3+)的高自旋态,并以相同的几率占据范德瓦尔斯间隙的八面体和四面体空隙。在这两个晶位上,铁离子的有效质量(M_(eff))接近57u,特征温度θ_M较低(分别为130K和107K)都说明插入的Fe^(3+)受到的作用力较弱。另外,还用SCC-DV-x。方法计算了铁的同质异能移,计算结果与实验符合得很好。
The57 Fe Mossbauer study has been performed for the intercalated compound 2H-Fe0.5-TaSe2 over a temperature range between 14 and 500 K. The intercalation samples 2H -Fex-TaSe2 with high content of Fe(x up to 2)are prepared by electrochemical method for the first time. The Mossbauer measurement shows that iron is in high spin state of Fe3+ and occupies both octahedral and tetrahedral interstices of the Van der Waals gap with same probabitity. The fact that effective masses Meff of iron ions in both sites are close to 57 u and the characteristic temperatures are found to be relatively small (M = 130K, 109K respectively) is attributed to the weak forces on Fe3+.
出处
《核技术》
CAS
CSCD
北大核心
1992年第8期473-477,共5页
Nuclear Techniques
关键词
插层化合物
穆斯堡尔谱
硒化钽
铁
Intercalated layer compound Effective mass Characteristic temperature
