摘要
本文用基于两体碰撞近似的蒙特卡罗模拟方法,研究不同相互作用势(Moliere势和Universal势)对溅射模拟计算结果的影响。讨论了入射角和入射能量与溅射产额的依赖关系,并给出它们的溅射粒子能谱、角分布及深度来源分布等计算结果。上述两种作用势计算结果与有关实验数据比较表明,Universal势与实验结果符合得更好,尤其是在入射离子低能区域。
The effects of two interaction potentials (Moliere and Universal) on computer simulation results of sputtering are investigated via Monte Carlo simulation based on the binary collision approximation. The dependence of incident angle and incident energy on sputtering yield are discussed. Energy spectrum and angular distributions of sputtered species as well as the depth of origin of the sputtered particles are also given. From a comparison between the related experimental data and the calculated results with above two interaction potentials it has been found that a better agreement is obtained for the Universal potential, especiallv at low energy range
出处
《核技术》
CAS
CSCD
北大核心
1992年第3期129-137,共9页
Nuclear Techniques
基金
国家高技术863资助项目
关键词
相互作用势
蒙特卡罗模拟
溅射产额
Interaction potential Monte Carlo simulation Sputtering yield
