摘要
设计了"H"型六维x y工件台,利用磁悬浮技术将工件台悬浮在x、y导轨上,消除了导轨的摩擦和磨损;直线电机无接触驱动实现了工件台的粗定位;控制不同磁悬浮电磁铁的电流大小,可以实现工件台的微定位以及逐场调平调焦。计算了工件台由于重力弯曲、热膨胀等原因引起结构变形而带来的精度误差,理论上分析证明工件台在x、y方向能满足0.02μm的定位精度要求以及达到0.1μm调焦精度和3.0μrad调平精度的要求。将应用于特征尺寸0.18μm线宽激光光刻机上。
An 'H'type xy stage that can locate a wafer in six degrees of freedom is designed. The stage is suspended on the x&y rails by applying magnetic levitation(Maglev.)technology.There are no friction and wearing to the rails. The stage is driven speedily and positioned coarsely by linear motors with noncontact driving,When controlling and adjusting the current of electromagnetic coils,fine positioning,fieldbyfield leveling and focusing to the stage can be implemented. Accuracy errors on stage caused by weight bending and thermal expansion of the construction are calculated.It is analyzed and proved that the stage can meet 0.02μm positioning accuracy in x?y axises,0.1 μm focusing accuracy and 3.0μrad leveling accuracy.This stage will be applied in the new generation of laser photolithography equipment with critical dimension 0.18μm.
出处
《微细加工技术》
2003年第1期15-21,共7页
Microfabrication Technology
基金
吉林省2002年度自然科学基金资助项目(20020621)
2002年度中国科学院研究生科学与社会实践资助专项创新研究类项目
关键词
光刻
磁悬浮
x-y工件台
定位精度
步进扫描
逐场调平调焦
photolithography
magnetic levitation
x-y stage
positioning accuracy
stepping and scanning
field-by-field leveling and focusing
