摘要
采用外部电极电容耦合的RF辉光放电装置研究了乙烯基三甲基硅烷(VTMS)与苯(Bz)、苯乙烯(St)以及六氟丙烯(HFP)的等离子体共聚合。用IR、ESCA、PGC/MS和X射线对聚合物结构进行表征,证明乙烯基三甲基硅烷与苯、苯乙烯以及六氟丙烯可进行共聚合。C/Si比的增加表明苯、苯乙烯和六氟丙烯的嵌入导致聚合物组成的变化,Si含量相对较低。共聚物中无Si-H键的形成。
In a capacitively coupled RF glow discharge with erternal electrodes
plasma copolymerizations of vinyltrimethylsilane (VTMS) with benzene (Bz), sty-
rene(St) and hexafluoropropylene(HFP) were carried out. The structures of the copo-
lymers were characterized with IR, ESCA, PGC/MS, and X-ray. It was found that
the copolymerizations of VTMS with Bz, St and HFP have occurred. The increase of
C/Si ratios of the copolymer indicates that the incorporation of Bz, St and HFP caused
the change of the copolymer composition, and as a result, the Si content of the copolymer
is relatively low. Si-H absorption peak does'nt appcar in IR spectra.
出处
《辐射研究与辐射工艺学报》
CAS
CSCD
北大核心
1992年第1期30-35,共6页
Journal of Radiation Research and Radiation Processing
基金
国家自然科学基金
关键词
等离子体
共聚合
有机硅聚合物
Plasma
Copolymerization
Vinyltrimethylsilane
IR
ESCA
PGC/MS
Character
