摘要
离子溅射修正是电子谱(俄歇电子谱,AES和X射线光电子谱,XPS)、离子谱(二次离子质谱,SIMS和低能离子散射谱,ISS)定量分析中的关键问题之一。本文根据作者最近提出的离子轰击合金表面成分再分布关系,得到了表面分析中离子溅射修正因子的分析表达式,总结了近十多年来合金离子溅射修正因子的一些较普遍的实验结果,用本文报道的计算关系较好地解释了这些实验结果。讨论了溅射修正因子受轰击离子参数(入射角、能量)、组分浓度等因素的影响。同时用本文给出的分析计算关系讨论了择优溅射、离子辐照诱导偏析和增强扩散效应对溅射修正因子的影响。
Ion sputtering correction is a basic problem in the electron spectroscopy (AES and XPS)quantitative analysis. According to the redistribution relationship of surface composition idunedcby ion bombardment which proposed by the authors, a new ion sputtering correction factor re-lationship was developed in the paper. General experimental results of sputtering correctionfactor of alloys were summarized. It was explained by the sputtering correction relationship.The influences of primary ion energy, incident angle and concentration on the correction factorwere discussed by the relationship. It is concluded that the main factors affecting sputteringcorrection are preferential sputtering(PS), ion radiation induced segregation (RIS) and radiationenhanced diffusion (RED).
关键词
合金
离子溅射修正
表面分析
Alloy
Ion sputtering correction
Surface analysis
