摘要
在常规掩膜电解加工过程中,侧壁溶解问题会导致扰流柱深径比难以满足加工要求。采用激光电解复合加工方法解决密集扰流柱加工难题,建立旋转掩膜电解加工扰流柱的成形仿真模型,开展激光电解复合加工扰流柱的成形仿真研究,并进行两种加工方法的实验验证。仿真结果表明:在旋转掩膜电解加工中,当扰流柱间隙小至1.2 mm、加工深度超过0.4 mm时,无法满足密集扰流柱加工需求;在激光电解复合加工中,当激光刻蚀深度为0.2~0.3 mm,扰流柱成形满足密集扰流柱加工需求。实验结果表明:扰流柱间隙仅为1.2 mm、激光刻蚀深度为0.2 mm时,可获得加工深度0.44 mm、直径0.63 mm的阵列密集扰流柱结构。
To address the issue of sidewall dissolution during conventional mask electrochemical machining(ECM),which prevents the aspect ratio of spoiler columns from meeting the machining requirements,a hybrid laser-electrolysis processing method is proposed to solve the challenges in machining dense spoiler columns.A numerical simulation model for the formation of spoiler columns via rotating mask ECM was established.Formative simulation studies were then conducted for both the rotating mask ECM and the hybrid laser-electrolysis processes.Experimental validations were subsequently performed to compare these two methods.The simulation results indicate that when using rotating mask ECM,processing fails to meet the requirements for dense spoiler columns when the gap between columns is as small as 1.2 mm and the machining depth exceeds 0.4 mm.In contrast,the hybrid laser-electrolysis process satisfies the forming requirements for dense spoiler columns when the laser etching depth ranges from 0.2 mm to 0.3 mm.Experimental results confirm that arrayed dense spoiler columns with a machining depth of 0.44 mm and a diameter of 0.63 mm can be successfully fabricated,even when the gap between adjacent columns is only 1.2 mm and the laser etching depth is 0.2 mm.
作者
肖丕庆
王登勇
张媛媛
江正阳
张军
XIAO Piqing;WANG Dengyong;ZHANG Yuanyuan;JIANG Zhengyang;ZHANG Jun(College of Mechanical and Electrical Engineering,Nanjing University of Aeronautics and Astronautics,Nanjing 210016,China)
出处
《电加工与模具》
北大核心
2025年第6期81-86,共6页
Electromachining & Mould
基金
国家自然科学基金项目(52175414)
江苏省自然科学基金项目(BK20220134)。
关键词
激光刻蚀
电解加工
扰流柱结构
密集阵列特征
laser etching
electrochemical machining
spoiler column
dense array feature
