摘要
介绍了聚合物阵列波导光栅(AWG)复用器的基本原理,进而用Al掩模制做聚合物AWG光波导。结果表明:AWG器件的制做工艺,Al掩模技术明显优于厚胶掩模技术。用这种技术制备的器件,其结构指标与理论设计相符合而且波导在1.55μm处实现了单模传输。
The basic principle, designed parameters and details of fabricated process were described for a polymeric arrayed waveguide grating (AWG) multiplexer. The polymeric AWG using aluminum as mask has fabricated for the first time. The results indicate that the technology using aluminum as mask is superior to the thick photoresist as mask in AWG fabrication. The structure target of fabricated device using this technology accords with the theoretic design and the waveguide achieved single-mode transmission in 1.55 μm.
出处
《光电子．激光》
EI
CAS
CSCD
北大核心
2002年第11期1097-1100,共4页
Journal of Optoelectronics·Laser
基金
国家重点基础研究发展规划资助项目(G2000036604)
国家高技术研究发展计划资助项目(2001AA312160)
