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Plasma spray-physical vapor deposition toward advanced thermal barrier coatings:a review 被引量:14

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摘要 Plasma spray–physical vapor deposition(PS–PVD)is a unique technology that enables highly tailorable functional films and coatings with various rare metal elements to be processed.This technology bridges the gap between conventional thermal spray and vapor deposition and provides a variety of coating microstructures composed of vapor,liquid,and solid deposition units.The PS–PVD technique serves a broad range of applications in the fields of thermal barrier coatings(TBCs),environmental barrier coatings(EBCs),oxygen permeable films,and electrode films.It also represents the development direction of high-performance TBC/EBC preparation technologies.With the PS–PVD technique,the composition of the deposition unit determines the microstructure of the coating and its performance.When coating materials are injected into a nozzle and transported into the plasma jet,the deposition unit generated by a coating material is affected by the plasma jet characteristics.However,there is no direct in situ measurement method of material transfer and deposition processes in the PS–PVD plasma jet,because of the extreme conditions of PS–PVD such as a low operating pressure of*100 Pa,temperatures of thousands of degrees,and a thin and high-velocity jet.Despite the difficulties,the transport and transformation behaviors of the deposition units were also researched by optical emission spectroscopy,observation of the coating microstructure and other methods.This paper reviews the progress of PS–PVD technologies considering the preparation of advanced thermal barrier coatings from the perspective of the transport and transformation behaviors of the deposition units.The development prospects of new high-performance TBCs using the PS–PVD technique are also discussed.
出处 《Rare Metals》 SCIE EI CAS CSCD 2020年第5期479-497,共19页 稀有金属(英文版)
基金 financially supported by the National Key R&D Plan(No.2017YFB0306103) the Fundamental Research Funds for the Central Universities the National Program for Support of Top-notch Young Professionals。
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  • 1郭洪波,彭立全,宫声凯,徐惠彬.电子束物理气相沉积热障涂层技术研究进展[J].热喷涂技术,2009,1(2):7-14. 被引量:38
  • 2黄光宏,王宁,何利民,牟仁德,贺世美.环境障涂层研究进展[J].失效分析与预防,2007,2(1):59-64. 被引量:20
  • 3Fu C H,,Yang Y J.Fundamentals of Physics on Electronic Techniques. . 1991
  • 4Wang Y D,Wang Q J,Fu J S, et al.Principles of Quantum Frequency Standard. . 1986
  • 5Hu Z Q,Zhen H S,Shi Y N.Gaseous Electronics. . 1985
  • 6Chen Z Z,Gao S X.Electric Conduction of Gases (II). . 1988
  • 7Ren L L,Cui J H.Optical emission spectrum online diagnoses for CH4+H2 discharge plasma system at atmospheric pressure. www.chemistrymag.org/cji . 2004
  • 8Wang H D,Ren L L,Gu J Q, et al.Physical Experimentation. . 1997
  • 9Orlando A,Daniel L F,Translated by Zheng S B,Hu J F,Guo S J, et al.Plasma Diagnostics (I). . 1994
  • 10Guo Z Y,Zhao W H.Arc and Thermal Plasmas. . 1986

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