摘要
研究了基体偏压和氧分压强影响 ITO 膜光谱的机理。确定出最佳氧分压为(8～10)×1O^(-3)pa,通过比较衬底高温法和衬底偏置法制备 ITO 膜的红外光谱,发现两者有相同的变化趋势。
Effect of bulk bias voltage and oxygen partial pressure on optical spectrum of ITO film is studied.The optimum oxygen partial pressure is about (8～10)×10^(-3)Pa.By comparing the IR spetra of ITO film prepared by heated substrate method and biased substrate method,we have discovered that the two kinds of IR spectra are nearly coincident with each other.
出处
《半导体光电》
CAS
CSCD
北大核心
1992年第2期144-147,159,共5页
Semiconductor Optoelectronics
