摘要
我国专利法再颁制度缺失带来两个问题:一是使捐献原则适用范围过大,二是对专利申请人撰写水平提出了过于严苛的要求。这些问题使专利权人处于不利地位,最终将导致专利制度无法实现其应有价值。我国应当借鉴美国再颁制度的相关规定,构建专利再授权制度。发明、实用新型说明书或者附图中有未在权利要求中记载的技术方案的,允许专利权人在原专利授权后一定时间内申请再次授予专利权,将上述技术方案纳入保护范围。
The lack of reissue system in China's Patent Law has brought about two problems: one is to make the scope of application of the disclosure-dedication rule too large, and the other is to impose too strict requirements on the writing skills of patent applicants. These problems put patentees at an unfavorable position. Ultimately, the patent system would not be able to achieve its due value. China should construct a patent regrant system under the guidance of relevant provisions of the US reissue system. In the specification or the drawings of the inventions or the utility models, there are technical solutions not described in the claims, which allows the patentees to apply for regranting the patents within a certain period of time after the original patents were granted.
作者
唐春
任鹏
Tang Chun;Ren Peng
出处
《电子知识产权》
CSSCI
2019年第7期4-10,共7页
Electronics Intellectual Property
关键词
授权后程序
再颁制度
再授权制度
捐献原则
Post-grant Procedure
Reissue
Patent Regrant System
the Disclosure-Dedication Rule
