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半导体制造领域显影工艺及显影喷嘴的发展 被引量:7

Development of Developing Process and Developing Nozzle in Semiconductor Manufacturing Field
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摘要 论述了显影工艺的发展及国内外对显影工艺的研究,指出了其存在的缺陷及技术发展难点,并对显影工艺中的重要部件显影喷嘴的发展过程进行了论述,介绍了各种显影喷嘴的工艺过程及结构功能,基于工艺要求分析了它们各自的优缺点以及可能产生的显影缺陷。从实际生产出发,针对显影工艺技术发展的客观趋势,指出了显影喷嘴的改进目标及未来发展方向。 The development of developing process and research of developing process at home and abroad are discussed in this paper. The defects existed in it and development difficulty of the technology are pointed out. The development process of the developing nozzle which is an important part in the developing process is discussed. The development process and structure function of various developing nozzles are introduced. Their advantages and disadvantages and developing defects they might produce are analyzed based on the process requirements. Aiming at the development trend of the developing process technology, the paper points out the imorovement target and the future development direction of the developing nozzle on the basis of actual production.
作者 刘学平 朱珂
出处 《机械工程与自动化》 2017年第5期219-221,223,共4页 Mechanical Engineering & Automation
基金 国家科技重大专项02专项资助项目(2012ZX02102)
关键词 显影工艺 显影喷嘴 均匀性 低冲击 developing process developing nozzle uniformity low impact
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