摘要
利用等离子体增强化学气相沉积法在Si（100）基体上制备不同H2/CH4流量比下的类金刚石薄膜,采用拉曼光谱、红外光谱、扫描电子显微镜（SEM）、纳米力学性能综合测试仪以及摩擦磨损试验机对薄膜的组织结构、力学以及摩擦学性能进行了分析。结果表明：该条件下制备的薄膜具有典型的类金刚石结构且膜中氢含量较高,薄膜表面光滑,膜层致密且均匀,薄膜的硬度及与基底的附着力均随着H2/CH4流量比的增加而降低。薄膜在大气环境下具有优异的摩擦学性能,在相同的载荷及转速条件下,H2/CH4流量比对薄膜的摩擦因数影响不大。当载荷为5N时,随着转速的增加,摩擦因数降低;而载荷为10N时,摩擦因数约为0.05,转速对其影响较小。薄膜的磨损率在10^-8~10^-7 mm^3/Nm之间变化,且随H2/CH4流量比的增加而增大。
Various hydrogen contented diamond-like carbon films have been deposited on Si（100） wafers by PECVD technology. The effect of flow ratio of H2 and CH4 on the friction and wear behaviors of hydrogen diamond-like carbon fihns had been investigated. The microstructure, cross section morphology, and mechanics characteristics were obtained by Raman spectroscopy, infrared spectrometry, scanning electronic microscope （SEM）, nano-hardness and nano-scratch tester. The tribological properties of films in ambient atmosphere at different loads and velocities were examined on a ball -disk tester. The result show that the films prepared by PECVD have typical hydrogenated diamond-like carbon charac teristics and high hydrogen content, showing good smooth and compact. With the increase of the flow ratio of H2 and CH4 , the hardness and adhesion force of the films decrease. The films own good tribology characteristics under ambient atmosphere, the flow ratio of H2 and CH4 has slight influence on the friction coefficient when the films undergo the same loads and velocities. Under high load, the velocities had little influence to the friction coefficient compared with low load. The wear rate of all films changes in the range of 10^-8- 10^-7 mm^3/Nm, and increases with the increase of the flow rate of H2 and CH4.
出处
《中国表面工程》
EI
CAS
CSCD
北大核心
2015年第1期42-48,共7页
China Surface Engineering
基金
装备预研基金(51318060205)
