摘要
采用磁控溅射和离子镀膜工艺在Mo基片上制备了具有不同晶粒尺寸的纯Ti薄膜 ,并利用X光衍射 (XRD)、透射电镜 (TEM )和扫描电镜 (SEM )分析和观察了两类Ti膜的结构和形貌。实验结果显示 :与溅射镀膜相比 ,离子镀膜的晶粒择优取向程度略低 ,Ti膜与基片结合较好 ;较高的基片温度有利于提高膜的致密程度 ,并降低膜的晶粒择优取向程序。
Ti films with different grain size are prepared by both magnet sputtering and ion plating. Microstructure and morphology of Ti film are analysed by X ray diffraction, TEM and SEM, respectively. In contrast with sputtered films, the optimization of grain orientation of ion plated Ti film is weaker and the cohesion between Ti film and Mo substrate is stronger. The films are denser and the optimization of grain orientation is weaker when substraites are heated to elevated temperature.
出处
《原子能科学技术》
EI
CAS
CSCD
2002年第4期380-383,424,共5页
Atomic Energy Science and Technology
基金
国家自然科学基金资助项目(50 1 30 50 )
