摘要
应用等离子体物理理论研究了离子镀光学薄膜中等离子体作用过程，得到了不同偏压条件下射入基片表面的离子和电子流密度和能量，从而为离子镀膜工艺参数的正确设计提供了理论依据。
The plasma physics has been used to study the plasma process of optical film deposition by reactive ion plating.In the present paper,the ion and electron incidence energies and densities on substrate surfaces are obtained at a different bias.These results provide the theory for the process designs of optical film deposition by reactive ion plating.
出处
《半导体光电》
CAS
CSCD
北大核心
1996年第1期35-38,共4页
Semiconductor Optoelectronics
