摘要
研究了激光惯性约束聚变 (ICF)实验中一种基础基准靶埋点靶的制备工艺过程。埋点靶的制备过程主要包括CH膜的制备、埋点的定位和埋点材料的制备。其中 ,CH薄膜的制备及其性质是制备埋点靶的关键工艺环节。最后给出了埋点靶的制备工艺流程。
The microspot target is one of the most important targets in the inertial confinement fusion(ICF) experiment, its fabrication technology is complicated. The target consists of a hydrocarbon(CH) film with a sharply defined spot(microspot) in the center seeded with another material. The target is fabricated using a three step procedure consisting of depositing the hydrocarbon film, defining the microspot, and depositing a seeded spot through a mask. The paper describes the production of CH film by the way of hot wire chemical vapor deposition, and focuses on the fabrication technology of the microspot target.
出处
《原子能科学技术》
EI
CAS
CSCD
2002年第4期313-315,共3页
Atomic Energy Science and Technology
基金
国防预先研究基金资助项目 (5492)
国家"863"惯性约束聚变领域资助项目 (863 41 6 3 3 3 1 1 )
