摘要
磁控溅射已经成为沉积薄膜的最重要的方法之一。然而 ,这种镀膜技术亦存在一些缺点 (例如 ,有限的溅射产额和反应溅射过程中等离子体不稳定等问题 ) ,所以它不适宜于在介质膜工业生产中应用。本文介绍了一种新的中频 (MF)电源供电的孪生靶磁控溅射。采用这种技术并结合智能化的工艺控制系统 (IPCS)特别对于反应沉积化合物镀层开辟了许多新的机遇 ,它能够在长期内获得高的沉积速率并处于稳定的镀膜状态。因此 ,大面积镀膜在建筑玻璃、汽车玻璃和显示器方面的应用就有了明显的进展并具有广阔的前景。
Magnetron sputtering has become one of the most important methods for depositing thin films. However, this technique suffers from some shortcomings (e.g.limited sputter yield and plasma instabilities in reactive sputter processes), making it often unsuitable for the production of dielectric layers. In this paper, a new mid frequency powered double magnetron cathode is presented. The use of this technique in combination with an intelligent process control system (IPCS) opens up a lot of opportunities especially for the reactive deposition of compound layers. High deposition rates and stable coating condition are attainable over a very long time. Therefor, the business and the technology of large-area vacuum coatings on glass for architectural, automotive and display application have made significant progress and are still proceeding with great expectation for the future.
出处
《真空》
CAS
北大核心
2002年第3期1-9,共9页
Vacuum
