摘要
本文通过对蓝色铬膜层的XPS分析及电化学方法研究了该膜层的沉积过程。结果表明,整个膜层可分为:120nm厚的交界层(主要成分是Cr和基底Ni),250nm厚的中间层(Cr_2O_3,Ct和CtSe,后者决定了膜层呈蓝色),以及100nm厚的表面层(吸附的Cr(Ⅵ)、Cr(Ⅲ),SeO_4^(2-)和Se),对电沉积历程和机理进行了探讨。
Blue chromium films prepared by cathodic electrodeposition on Ni substrate in a solutionof CrO_3, H_2SO_4 and H_2SeO_4 have been studied by XPS and electrochemical measurement. Theresults indicated that the blue chromium films were made up of three layers, correspondingto the three steps in deposition: (1)The reduction of an oxide layer (NiOCrOH) to metallicNi and Cr, which made an inner layer of about 120nm in thickness. (2)The reduction ofCr(Ⅵ)and the depositions of Cr, Cr_2O_3 and CrSe, which formed a medium layer of about250nm. (3)The deposition and absorbtion of Cr(Ⅲ) and H_2SO_4 and its reduced products,which formed an outer layer of about 100nm.
出处
《应用化学》
CAS
CSCD
北大核心
1991年第1期6-9,共4页
Chinese Journal of Applied Chemistry
基金
福建省科学基金
关键词
薄膜
铬
电沉积
阴极膜
镀铬
blue chromium film
cathodic film
XPS
H_2SeO_4
CrO_3
CrSe
