摘要
约束刻蚀剂层技术是三维超微图形复制加工的新型技术。本文根据约束刻蚀剂层技术的工艺特点 ,介绍了约束刻蚀剂层电化学微加工仪器的组成 ,讨论了具有微力传感的纳米级微定位系统的研究与开发。利用研制的加工仪器 ,在半导体GaAs进行刻蚀加工 ,复制出微孔阵列 ,其排列周期与模板的微锥阵列的排列周期吻合得很好 。
Confined Etchant Layer Technique(CELT) is a new method of electrochemical micromachining, the paper introduces the composing of machine tool based on the processing features of CELT, and discusses the development and research of nanopositioner with micro load sensor. The microhole arrays has been etched in the crystal GaAs with CELT machine tool. The period parameters of the etched microhole arrays are very agreement with that of mold with micro cone arrays. And the microhole has been etched in copper.
出处
《高技术通讯》
EI
CAS
CSCD
2002年第6期83-87,共5页
Chinese High Technology Letters
基金
国家自然科学基金 ( 2 98330 70
50 1750 19)资助项目
