摘要
介绍了高效工程镀铬工艺的研究。采用该工艺,可以在铬酐浓度为400～500克/升的条件下使电流效率达30～38%,沉积速率达100微米/小时以上。文中介绍了工艺的主要特点以及槽液组分和工艺条件对电流效率的影响。
A high efficiency hard chromium plating process was developed. In a bath contained 400-500g/l chromic acid, an efficiency up to 30-38% and a deposition rate largerthan 100μm/h were obtained. The effects of the bath compositions and plating conditions on the efficiency were also discussed.
出处
《材料保护》
CAS
CSCD
北大核心
1989年第5期17-21,3,共5页
Materials Protection
基金
机械工业技术发展基金项目
