摘要
为了研究纹状体边缘区和痛觉的关系 ,用 c- fos和 NADPH- d双标记方法研究了大鼠面部伤害性刺激后 c- fos蛋白(Fos)和 NOS在纹状体边缘区的表达。面部伤害性刺激后 30分钟 ,边缘区中即出现 Fos表达 ,刺激后 3小时 ,Fos表达达最高峰 ,而且主要在边缘区部位表达。正常大鼠纹状体边缘区中有密集的 NOS阳性神经元及纤维 ,面部伤害性刺激 3小时后 ,纹状体其余部位的 NOS阳性胞体及纤维减少或消失 ,但边缘区中仍保留 ,并可见少数 Fos和 NOS双标记细胞。提示纹状体边缘区可能和面部痛觉的调制有关。
To investigated the relationship between marginal division and pain, the expression of c fos and NOS in the marginal division of rat striatum after facial noxious stimulation was studied using c fos protein(Fos) and NADPH d double labeling method. Fos was found in the striatum 30 min after noxious stimulation. The highest expression level of Fos was found 3 hours after stimulation and was located mainly in the marginal division. The dense NOS positive neurons and fibers were found in the marginal division of normal rat striatum. 3 hours after facial noxious stimulation, besides the Fos expression in the striatum, the NOS positive neurons and fiber decreased or disappeared in the striatum, but remained in the marginal division. A few Fos and NOS double labeled neurons were found in the marginal division of striatum. The results suggested that the marginal division of striatum might be involved in facial pain modulation.\;
出处
《中国组织化学与细胞化学杂志》
CAS
CSCD
2000年第2期121-125,共5页
Chinese Journal of Histochemistry and Cytochemistry
基金
国家自然科学基金资助项目!(39770 5 5 0 )
广东省自然科学基金资助项目!(95 0 5 5 4)
