摘要
研究了同位镀汞电位溶出法测定铜的最佳分析条件。试验结果表明 ,在 0 0 0 85mol/LH2 SO4 HNO3介质中 ,铜的峰电位为 -0 0 5V ,检出限为 0 5 μg/L ,线性范围为 2 5～ 2 0 μg/L。用于环境水质标样、纯净水中铜的测定 。
The optimum conditions for the determination of copper by defferential potential stripping analysis and mercury plating in situ have been studied It was found that the sensitive stripping peak potential of Cu*' is -0 05V(vs.SCE) in a supporting electrolyte of 0 0085mol/L H 2SO 4-HNO 3 The detection limit is 0 5μg/L for Cu*' and the linear relationship is in the range of concentration of 2 5-20μg/L for Cu*'. When the method is applied to the determination of copper in the environmental water reference sample and drinking water,the results are satisfactory
出处
《冶金分析》
CAS
CSCD
北大核心
2002年第1期52-53,共2页
Metallurgical Analysis
关键词
铜
散分电位溶出法
水样
测定
copper
differential potential stripping analysis
water sample
