摘要
低温等离子体技术已被广泛应用于各高科技领域 ,并且应用范围仍然在迅速拓展 ,这对等离子体本身提出了更高的要求 ,平面大面积、高密度均匀等离子体源是目前最迫切的需求之一。作者主要介绍表面波激发等离子体的原理 ,并在自行研制的一套平面大面积表面波等离子体源上 ,利用静电双探针测量了其Ar气放电的角向、径向和轴向的电子密度和温度。发现角向电子密度和温度均匀性与耦合天线及气压密切相关而与入射功率无关 ;径向电子密度和温度均匀性则与入射微波功率及气压密切相关而与耦合天线无关。因此 ,通过优化耦合天线来获得径向参数的均匀性及微波耦合效率 ,并增大微波功率、选择适当的气压 。
Low temperature plasma technologies have been widely used in many high_tech fields today. The fields applying plasma are still enlarged quickly.The higher demands have been arised for the plasma high density and the large area planar uniformed plasma was required as one of the most urgent demands now.The principles of surface microwave forming were introduced. Radial,azimuthal and axial distribution of the electron density and temperature of Ar plasma in the plasma source excited by surface_microwave were measured with Langmuir probe.The relationship that the uniform degree of the electron density and the temperature distribution along radius and azimuth changes with the microwave power,the gas pressure and the antenna shape was found that the power and the antenna shape is not important for the azimuthal and radial uniform degree,respectively.So a conclusion reached that large area planar high density plasma could be produced by improving the antenna shape ,enhancing the microwave power and choosing the proper pressure.
出处
《真空与低温》
2002年第1期28-33,45,共7页
Vacuum and Cryogenics
基金
国家自然科学基金资助批准号 :19875 0 5 5
