摘要
用表面波等离子体装置进行了类金刚石薄膜的合成实验 ,研究了微波功率、基底负偏压和气体组成等条件对成膜的影响。用拉曼光谱和扫描电子显微镜对薄膜结构和表面形貌进行了分析 ,得出在 10 0Pa的工作气压下 ,使用CH4 放电 。
Diamond like films were deposited with plasma excited by surface waves.Various film growth parameters including microwave power,negative substrate bias and compositions of the working gases,were studied to optimize film growth.Surface morphology and structures of the films were studied with Raman spectroscopy and scanning electron microscopy.We found that high quality films can be obtained under the conditions as follows:a operating pressure of 100 Pa,pure CH 4 discharge,large microwave power and high substrate bias.
出处
《真空科学与技术》
CSCD
北大核心
2001年第5期391-393,397,共4页
Vacuum Science and Technology
基金
国家自然科学基金资助项目 (1983 5 0 3 0
19875 0 5 3 )
