摘要
采用射频溅射工艺制得细小均匀的 β-Sn纳米锡膜 ,然后通过氧化处理工艺获得组织非常细小均匀的纳米级二氧化锡薄膜 .X-衍射实验结果表明 Sn和 Sn O2 晶粒尺寸分别约为 6 nm和 5 nm,采用该工艺获得的Sn O2 纳米薄膜结构比较稳定 ,为薄膜型 Sn O2
The technology of SnO 2 nanocrytalline thin-film prepared by RF-sputtering are studied in this paper,and results show that the nanocrytalline thin-film β-Sn can be prepared by RF-sputtering,and then the nanocrytalline thin-film SnO 2 can be obtained by suitable oxidation technology.The X-ray experiments indicate that the nanocrytalline thin film Sn and the nanocrytalline thin-film SnO 2 are tiny,uniform and stable and the grain sices are 5nm and 6nm respectively.
出处
《广西师范大学学报（自然科学版）》
CAS
2001年第4期64-67,共4页
Journal of Guangxi Normal University:Natural Science Edition
