摘要
本文介绍了ITO(Indium Tin Oxide)透明导电膜的制备工艺,对影响其光学和电学特性的因素作了分析。并讨论了透明导电的机理,在K9玻璃上制备的ITO透明导电膜,在500～600nm波长范围内,典型的峰值透过率为90％,面电阻为40～50Ω/□。用该技术制备的样品作为透明电极,在液晶光阀空间光调制器中得到了应用。
The deposition processes of optical transparent and electrocondutive Indium Tin Oxide(ITO)films prepared by electron beam technique have been presented. The principles of the ITO films have been explained with semiconductors physics theory. Films with sheet resistance of 40～50Ω/□ and peak transmittance of 90% in visible region have been deposited on K9 glass substrate. The effects of some main process parameters on the optical and electrical properties of ITO films have been investigated. Such ITO films have been used in the Liquid Crystal Light Valve(LCLV).
出处
《激光与红外》
CAS
CSCD
北大核心
1991年第4期39-42,共4页
Laser & Infrared
关键词
导电膜
工艺
液晶光阀
调制器
transparent and electrically conductive ITO films
