摘要
本文综述了近年来激光辅助固态薄膜淀积技术的进展。简要概述了脉冲激光蒸发淀积(PLED)和激光诱导化学气相淀积(LCVD)的基本原理、淀积系统和激光器。侧重详细介绍了这种技术在制备微电子器件所需要的高 T_c 超导体膜、金属膜、半导体膜和介质膜中的应用。
This atticle reviews recent advances in deposition techn- ique of laser-assisted solid state thin films.The basic principles, deposition systems and laser sources of pulsed laser evaporation depo- sition(PLED) and laser-induced chemical vapor deposition(LCVD) are simply introduce.Applications of this technique in preparing the thin films,such as high-T.superconductive films,metallic films,semicondu- ctive films and insulation films,used in microelectronic elements are thoroughly presented.
出处
《激光技术》
EI
CAS
CSCD
1991年第5期284-289,共6页
Laser Technology
关键词
半导体器件
固态薄膜
激光
淀积
Lasers
Chemical Deposition
Metallic Films
Superconducting Films
