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飞行时间质谱法研究环氧乙烷多光子电离和解离过程 被引量:5

Study on Multiphoton Ionization and Dissociation Process of Ethylene Oxide Using TOF-Mass Spectroscopic Method
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摘要 本文采用脉冲分子束和飞行时间质谱技术研究在UV激光辐照下环氧乙烷多光子电离和解离过程,测得在308nm激光辐照下主要解离产物为HCO^+。CH^+和C_2H_3O^+.其光强指数分别为2.8,2.9和2.9.此外也观察到少量CH_2^+,CH_4^+,和H^+等产物离子.在355nm激光辐照下主要解离产物为HCO^+,CH_3^+,CH_2^+,CH^+和CH_3CO^+以及少量H^+和C^+等.对于HCO^+,CH_3^+,CH_2^+,CH^+和H^+离子,其光强指数依次为4.0,3.1,3.5,3.7和4.1.根据实验结果,对于环氧乙烷多光子电离和解离过程的机理作了讨论. Multiphoton ionization and dissociation (MPID) of ethylene oxide molecule at 308nm and 355nm laser radiation are investigated using a pulsed molecular beam and time of flight mass spectrometric techniques. Three relative strong peaks assigned to HCO^+, CH_3^+ and C_2H_3O^+ and some week peaks assigned to CH_2^+, CH_4^+, H^+ etc. are observed from the MPID-TOF mass spectrum of ethylene oxide under 308nm laser irradiation. The dependence of the ion signal intensity on laser power is measured. The laser power dependence of HCO^+, CH_3^+, and C_2H_3O^+ are 2.8, 2.9 and 2.9, respectively. In the case at 355nm laser radiation, the major products of MPID of ethylene oxide are HCO^+, CH_3^+, CH_2^+, CH^+ and CH_3CO^+. In addition, some week peaks assigned to H^+, C^+are also observed. The laser power dependence of HCO^+, CH_3^+, CH_2^+, CH^+, and H^+ are 4.0, 3.1, 3.5, 3.7 and 4.1 respectively. According to these results,the mechenism of MPID process of ethylene oxide can be proposed as follows: firstly, the ethylene oxide is ionized by 3 and 4 photons absorption under 308nm and 355nm laser irradiation, respectively, then the excited ethylene oxide ion is isomerized to the acetaldehyde structure and immediately dissociated into the fragments.
出处 《Chinese Journal of Chemical Physics》 SCIE CAS CSCD 1991年第2期79-84,共6页 化学物理学报(英文)
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参考文献2

  • 1朱荣,物理学报,1987年,36卷,4期,459页
  • 2Lin Takong,J Chem Phys,1949年,17卷,241页

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