摘要
采用超声分子束技术，以飞行时间质谱仪，在４１０～３７１ｎｍ内着重检测了不同波长、不同能量的激光对气相Ｓｉ（ＣＨ３）４分子多光子电离（ＭＰＩ）飞行时间（ＴＯＦ）质谱产物分布的影响。根据实验结果，对Ｓｉ（ＣＨ３）４分子多光子解离电离可能经历的通道和反应机理进行了讨论。
The multiphoton dissociation and ionization of Si(CH 3) 4in a supersonic molecular beam was investigated with a XeCl excimer laser (308nm) and a tunable dye laser (410-371nm) by a Time of Flight (TOF) mass spectrometer. According to the experimental results, it concluded that the Si +ions might be mainly produced via a sequential photodissociation to form Si atoms first and followed by a nonresonant or resonant enhanced multiphoton ionization of Si atoms , whereas Si(CH 3) 4(n=1,2,3) ions might be mainly produced via the photodissociation of Si(CH 3) 4to form neutral molecular fragments first and followed by auto ionization. The mechanism of the laser induced multiphoton dissociation and ionization was discussed.
出处
《原子与分子物理学报》
CAS
CSCD
北大核心
1996年第4期392-396,共5页
Journal of Atomic and Molecular Physics
基金
国家自然科学基金
关键词
飞行时间质谱
反应动力学
四甲基硅
Si(CH 3) 4TOF mass spectra Multiphoton dissociation and ionization Chemical kinetics Mass spectra peakwidth
