摘要
采用微波等离子体化学气相沉积法,以氢气和甲烷为主要反应气源进行了大面积金刚石膜的沉积,研究了基片温度、微波功率和沉积气压对大面积金刚石膜均匀性的影响.采用红外测温仪测量基片不同区域的温度,利用扫描电子显微镜表征金刚石膜不同区域的表面形貌.结果表明:较高的微波功率有利于提高金刚石膜的沉积面积和沉积质量,但随着微波功率的提高,基片温度的均匀性也逐渐降低.在对装置的基片台和天线结构进行优化改进后,获得了均匀性较好的基片温度.在改进后的装置中产生的等离子球状态稳定,利用合适的工艺参数沉积得到了均匀性较好的大面积金刚石膜.
Large area diamond films were deposited by microwave plasma chemical vapor deposition method with hydrogen and methane as gas source.The influences of substrate temperature,microwave power and deposition pressure on uniformity of large area diamond films were studied.The temperatures of different regions on substrate were observed by infrared radiation thermometer and the surface morphology was characterized by scanning electron microscopy.Results show that higher microwave power is benefit to increase the deposited area and quality of diamond films,but substrate temperature uniformity decreases with microwave power increasing.The better uniformity of substrate temperature is obtained after improving the substrate holder and structure of the antenna.The plasma ball is stable in the improved apparatus,finally the large area uniform diamond films are obtained with appropriate parameters.
出处
《武汉工程大学学报》
CAS
2014年第6期14-19,共6页
Journal of Wuhan Institute of Technology
基金
国家自然科学基金项目(11175137)
关键词
化学气相沉积
均匀性
金刚石膜
chemical vapor deposition
uniformity
diamond film
