摘要
用微弧氧化的方法在铸造铝 -硅合金基体上获得陶瓷层。分别研究了电流密度及强化时间对陶瓷层厚度、表面粗糙度及硬度的影响 ,以及强化时间对成膜速度的影响。结果表明 :陶瓷层厚度、表面粗糙度都随电流密度及强化时间的增大而增大 ,膜厚随二者增加有一极限值 :硬度随电流密度增加而增加 ,也有一极限值 :成膜速度在较低电流密度时不随时间而变 ,在较高电流密度时 ,成膜速度随时间增加而下降 ,最终趋于零 ,电流密度越高 ,下降速度越快。
Ceramic coating was obtained by micro arc oxidation on the substrate of casted aluminum silicon alloy. The influence of current density and intensifying time on the thickness, the surface roughness and the hardness of the ceramic layer, and the influence of intensifying time on the forming velocity of the layer are studied in this paper. The results show that both the thickness and the surface roughness of the layer increase. There is a limit value in the thickenss with the increase in current density and intensifying time. The hardness increases and there is a limit value with the increase in the current density. In lower current density, the forming velocity of the ceramic layer does not vary with the intensifying time, while it decreases with the increment of intensifying time in higher current density, and its value approximates zero in the end. The higher the current density is, the faster the decrease of forming velocity.
出处
《电镀与精饰》
CAS
2001年第1期32-34,40,共4页
Plating & Finishing
